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Thursday, May 7, 2009
As with lock stitch designs, any Chenille design created in ES Designer will be scaled from the outlines. But because parallel offset runs are used so frequently, Chenille users have to apply some thought and some special techniques to their digitizing.

Object-based embroidery means that when designs are scaled, the stitches are automatically recalculated from the object outlines. Densities are preserved and there are no gaps or heavy over-stitching. Even the Chain and Moss boundary runs of Complex Fill areas are recalculated with the same offsets. Object outlines can be reshaped and the stitches are again recalculated to the new shape.

As far as possible, Chenille designs and alphabets should be planned to use Complex Fill input with Compound Chenille to generate the offset runs.

The offset runs can be generated in different colors.

When an old Chenille design is read from expanded data (e.g. Melco EXP, Tajima or Barudan disk), the Stitch Processor in ES Designer converts the stitching into objects. It does not fully recognise Coil and straight stitching, so will be converted to a series of Run stitch objects. This limits the scaleability of these old designs to ± 5-10%. However, old designs can be
readily stitch edited and sections re-digitized if required.